Whether your metal lift off process demands a fully automated process or simply a manual configuration, JST's Lift Off Stations offer dry to dry, cost effective solutions for the removal of residual metals.The wafer cassette is loaded onto the agitation arm and submersed into a heated solvent bath. The unit is programmed for mechanical agitation. During this agitation cycle, the stripping solvent is recirculated through the reservoir where it is filtered and returned to the agitation bath. This continual filtration prevents redeposition of the metals onto the wafers. A removeable filter is located in the solvent reservoir to capture the heavy lift off metals for easy reclaim. Once the cycle is completed, the stripping solvent is drained back to the reservoir where it is again filtered through a submicron filter and kept heated to temperature for use in the next cycle.

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